Three-Mask Lithography-Based Compliant Interconnects Patent

Provisional Patent, "Three-Mask Lithography-Based Compliant Interconnects for Microelectronic Applications", G. Lo, Q. Zhu, L. Ma, and S. K. Sitaraman, Filed in 2004, Based on Invention Disclosure #3166.

type: 
Provisional Patent
Year: 
2 004