Cure Optimization and Process Guidelines for a Novel Epoxy Photo-Dielectric Dry Film for Microvia Applications

Citation: 
Dunne, R. C., Sitaraman, S. K., Rao, Y., Luo, S., Wong, C. P., Estes, W. E., Gonzalez, C. G., Murray, E. B., Overcash, T. R., Anderson, R. E., Coburn, J. C., and Periyasamy, M., “Cure Optimization and Process Guidelines for a Novel Epoxy Photo-Dielectric Dry Film for Microvia Applications,” 8th Electronic Circuits World Convention, Tokyo, September 1999.