Failure mechanisms and optimum design for electroplated copper Through-Silicon Vias (TSV)

Citation: 
Liu, X., Chen, Q., Dixit, P., Chatterjee, R., Tummala, R. R., and Sitaraman, S. K., “Failure mechanisms and optimum design for electroplated copper Through-Silicon Vias (TSV),” 59th Electronic Components and Technology Conference, IEEE-CPMT and EIA, San Diego, CA, May 2009, pp. 624 – 629.